The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2025
Filed:
Feb. 14, 2025
Markondeyaraj Pulugurtha, Miami, FL (US);
Satheesh Bojja Venkatakrishnan, Miami, FL (US);
John Volakis, Miami, FL (US);
Peeyush Awasthi, Miami, FL (US);
Anthony Giordano, Miami, FL (US);
Markondeyaraj Pulugurtha, Miami, FL (US);
Satheesh Bojja Venkatakrishnan, Miami, FL (US);
John Volakis, Miami, FL (US);
Peeyush Awasthi, Miami, FL (US);
Anthony Giordano, Miami, FL (US);
The Florida International University Board of Trustees, Miami, FL (US);
Abstract
Systems and methods are provided for inline process monitoring (e.g., remote inline process monitoring) for scalable and precision high-yield manufacturing. Antenna probes, such as millimeter (mm) wave (mmWave) antenna (mWA) probes, can be introduced into fabrication equipment to reveal the nature of hidden conductor and/or dielectric defects, as well as via-pad and/or device pad-trace misalignments, going beyond automated optical inspection (AOI) or contact probing.