The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2025

Filed:

May. 11, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Chao Liu, Singapore, SG;

Yudong Hao, Fremont, CA (US);

Shifang Li, Pleasanton, CA (US);

Andreas Schulze, Campbell, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); G05B 19/418 (2006.01); G06F 18/20 (2023.01); G06F 18/23 (2023.01); G06N 20/20 (2019.01); G06N 20/00 (2019.01);
U.S. Cl.
CPC ...
G05B 19/41885 (2013.01); G05B 2219/33034 (2013.01); G06F 18/20 (2023.01); G06F 18/23 (2023.01); G06N 20/00 (2019.01); G06N 20/20 (2019.01); H01L 21/67 (2013.01);
Abstract

A method includes receiving, by a processing device, first data. The first data includes data from one or more sensors of a processing chamber and is associated with a processing operation. The first data is resolved in at least two dimensions, one of which is time. The method further includes providing the first data to a model. The method further includes receiving from the model second data. The second data includes an indication of an evolution of a processing parameter during the processing operation. The method further includes causing performance of a corrective action in view of the second data.


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