The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2025
Filed:
Mar. 23, 2022
Applicant:
Changxin Memory Technologies, Inc., Hefei, CN;
Inventor:
Wei Li, Hefei, CN;
Assignee:
CHANGXIN MEMORY TECHNOLOGIES, INC., Hefei, CN;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); H01L 23/544 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70616 (2013.01); G03F 7/70625 (2013.01); G03F 7/70633 (2013.01); G03F 7/70683 (2013.01); H01L 23/544 (2013.01);
Abstract
A critical dimension measurement mark structure includes a target area and a first pattern area located in the target area. The first pattern area and the target area are located on different horizontal planes. The first pattern area includes a first measurement part and a second measurement part which have different line widths, and the first measurement part and the second measurement part form an asymmetric open continuous pattern.