The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2025

Filed:

Aug. 05, 2019
Applicant:

Hd Microsystems, Ltd., Tokyo, JP;

Inventors:

Atsutaro Yoshizawa, Hitachi, JP;

Satoshi Yoneda, Hitachi, JP;

Akira Asada, Hitachi, JP;

Masayuki Ohe, Hitachi, JP;

Tetsuya Enomoto, Hitachi, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/031 (2006.01); C08G 73/10 (2006.01); G03F 7/028 (2006.01); G03F 7/038 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
G03F 7/031 (2013.01); C08G 73/10 (2013.01); G03F 7/028 (2013.01); G03F 7/0387 (2013.01); G03F 7/40 (2013.01);
Abstract

A photosensitive resin composition comprises a polyimide precursor having a polymerizable unsaturated bond; one or more compounds represented by any of the following formulas (1) to (4); and photopolymerization initiator represented by the following formula (11). In formulas (1) to (4), R, R, and Rare independently an alkyl group including 1 to 4 carbon atoms, and Rto Rare independently a hydrogen atom, or an alkyl group including 1 to 4 carbon atoms; and in the formula (11), Ris an alkyl or alkoxy group including 1 to 12 carbon atoms, a cycloalkyl group including 4 to 10 carbon atoms, a phenyl group, or a tolyl group; Ris an alkyl group including 1 to 12 carbon atoms, a cycloalkyl group including 4 to 10 carbon atoms, a phenyl group, or a tolyl group; and Ris a benzoyl group, a fluorenyl group, or a carbazolyl group.


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