The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2025
Filed:
Jul. 11, 2022
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Hajime Nakabayashi, Nirasaki, JP;
Tomohito Yamaji, Nirasaki, JP;
Kazuki Yamada, Nirasaki, JP;
Ryuichi Asako, Nirasaki, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/22 (2012.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
G03F 1/22 (2013.01); H01L 21/0332 (2013.01); H01L 21/0337 (2013.01);
Abstract
A pattern formation method includes: forming a photosensitive hard mask made of a transition metal oxide film on a surface of a substrate; exposing the photosensitive hard mask to EUV light in a desired pattern; causing a state change in an exposed region by heat generated during exposure; and selectively removing either a region where the state change has occurred or a region where the state change has not occurred.