The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2025
Filed:
Aug. 12, 2020
Hitachi High-tech Corporation, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
The present invention pertains to a surface analysis device () and provides a technology that can increase accuracy and quality of measurement and analysis even when a local deviation is generated in height information of a measurement result of a scanning probe microscope (SPM) (), due to an atmospheric pressure change with respect to an airtight tank (). The surface analysis device () is provided with: an airtight tank (); a stage () that holds a sample () in the airtight tank (); the SPM () that is fixed to a structure configuring the airtight tank () and that measures the surface of the sample (); a sensor () that is disposed outside of the airtight tank () and that measures atmospheric pressure; and a computer system that analyzes the surface of the sample by using a first signal obtained through measurement by the SPM () and a second signal obtained through measurement by the sensor ().