The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 05, 2025

Filed:

Dec. 12, 2023
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Nai-Wen Pi, San Jose, CA (US);

Jinxin Fu, Fremont, CA (US);

Kang Luo, San Jose, CA (US);

Ludovic Godet, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/48 (2006.01); C03C 23/00 (2006.01); C23C 14/00 (2006.01); C23C 14/02 (2006.01); C23C 14/58 (2006.01); G02B 6/10 (2006.01);
U.S. Cl.
CPC ...
C23C 14/48 (2013.01); C03C 23/0095 (2013.01); C23C 14/0031 (2013.01); C23C 14/021 (2013.01); C23C 14/5873 (2013.01); G02B 6/10 (2013.01);
Abstract

Embodiments described herein provide for optical devices with methods of forming optical device substrates having at least one area of increased refractive index or scratch resistance. One method includes disposing an etch material on a discrete area of an optical device substrate or an optical device layer, disposing a diffusion material in the discrete area, and removing excess diffusion material to form an optical material in the optical device substrate or the optical device layer having a refractive index greater than or equal to 2.0 or a hardness greater than or equal to 5.5 Mohs.


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