The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 29, 2025

Filed:

Apr. 11, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Yuan-Sheng Huang, Taichung, TW;

Kaochao Chen, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/528 (2006.01);
U.S. Cl.
CPC ...
H01L 23/528 (2013.01);
Abstract

Some implementations described herein provide techniques and apparatuses for forming a semiconductor device including a metal-insulator-metal capacitor. The metal-insulator-metal capacitor includes a dielectric pad layer having a portion between a capacitor bottom metal electrode layer and a portion of an insulator layer. The dielectric pad layer may preserve a thickness of the insulator layer to reduce a likelihood of a leakage between a capacitor top metal electrode layer and the capacitor bottom metal electrode layer. The dielectric pad layer may also enable a reduction in a thickness of the insulator layer to increase a capacitance of the metal-insulator-metal capacitor.


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