The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2025
Filed:
Jan. 17, 2025
Hefei Institutes of Physical Sciences, Chinese Academy of Sciences, Anhui, CN;
Yongjian Xu, Anhui, CN;
Yue Hu, Anhui, CN;
Ling Yu, Anhui, CN;
Chundong Hu, Anhui, CN;
Yuanlai Xie, Anhui, CN;
Abstract
The present disclosure discloses a method for measuring a beam divergence angle of a high-current particle beam based on a one-dimensional carbon fiber composite material, relating to the field of high-current particle beam diagnosis. The method includes: collecting infrared images according to experiment requirements by setting parameters of an infrared camera; obtaining original infrared images and temperature data files before and after beam current bombardment; converting an array file containing temperature information into an RGB picture format; performing perspective distortion correction on the acquired infrared images through a one-dimensional CFC diagnosis calorimeter and a geometric installation position of the infrared camera; converting the corrected image files into csv data format files; performing subtraction on a series of temperature data; selecting rows and columns to be analyzed for the plurality of csv data format files, retrieving a maximum value of temperatures within an area, and performing normalized Gaussian fitting; and analyzing a width at a 1/e height of the fitted Gaussian curve, and calculating the beam divergence angle according to a formula. The present disclosure provides a basis for operation parameter adjustment of an ion source and safe and stable operation of a system.