The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2025
Filed:
May. 15, 2020
Lam Research Corporation, Fremont, CA (US);
Andrew Liang, San Jose, CA (US);
Nader Shamma, Cupertino, CA (US);
Rich Wise, Los Gatos, CA (US);
Akhil Singhal, Beaverton, OR (US);
Arpan Pravin Mahorowala, West Linn, OR (US);
Gregory Blachut, Campbell, CA (US);
Dustin Zachary Austin, Tigard, OR (US);
LAM RESEARCH CORPORATION, Fremont, CA (US);
Abstract
A method for patterning a substrate includes providing a substrate, and depositing a multi-layer stack including N layers on the substrate. N is an integer greater than one. The N layers include N mean free paths for secondary electrons, respectively. The method includes depositing a photoresist layer on the multi-layer stack, wherein the N mean free paths converge in the photoresist layer. Another method for patterning a substrate includes providing a substrate and depositing a layer on the substrate. The layer includes varying mean free paths for secondary electrons. The method includes depositing a photoresist layer on the layer. The varying mean free paths for secondary electrons converge in the photoresist layer.