The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2025
Filed:
Aug. 17, 2021
Ebara Corporation, Tokyo, JP;
Shuji Uozumi, Tokyo, JP;
Kenichi Suzuki, Tokyo, JP;
EBARA CORPORATION, Tokyo, JP;
Abstract
Provided is a technique that can optimize a flow volume of a first liquid supplied into a cleaning member. A substrate cleaning apparatus includes: a holding portion having a bearing portion that rotatably holds a cleaning member for cleaning a substrate; a first supply portion that is at least partially arranged inside the holding portion and supplies the first liquid into the cleaning member through the inside of the holding portion; and a second supply portion that supplies a second liquid to the bearing portion. The holding portion is equipped with a discharge portion that has a discharge port for discharging the liquid accumulated inside the holding portion. The discharge portion is equipped with a flow meter that measures a flow volume of the liquid discharged from the discharge port.