The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2025
Filed:
Feb. 15, 2023
Dassault Systemes, Vélizy-Villacoublay, FR;
Aurelien Jean Marie Alleaume, Montreal, CA;
Nicolas Duny, Vélizy-Villacoublay, FR;
Mark Loriot, Vélizy-Villacoublay, FR;
DASSAULT SYSTEMES, Velizy-Villacoublay, FR;
Abstract
The disclosure relates to a computer-implemented method for tessellation processing. The tessellation forms a surface representation of a real-world 3D object. The method comprises providing a constrained tetrahedral Delaunay mesh comprising the tessellation. The mesh is conformal and comprises one or more sets of tetrahedrons, each set representing a gap between portions of the tessellation, each gap having a size lower than a predefined threshold. The method further comprises determining a set of one or more tetrahedra faces of the mesh to be added to the tessellation, includes minimizing an objective function that includes a term penalizing surface creation by face addition to the tessellation. The minimization is under the constraint that a given set of tetrahedra faces of the Delaunay mesh is to be added to the tessellation. The given set of tetrahedra faces includes, for each gap of one or more gaps, the tetrahedra faces meshing the gap.