The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2025
Filed:
May. 25, 2023
Applicant:
Resonac Corporation, Tokyo, JP;
Inventors:
Assignee:
Resonac Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); C08K 3/22 (2006.01); C08K 3/36 (2006.01); C08K 5/3412 (2006.01); C08K 5/3462 (2006.01); C08L 33/02 (2006.01); C08L 33/04 (2006.01); C08L 71/02 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); C08K 3/22 (2013.01); C08K 3/36 (2013.01); C08K 5/3412 (2013.01); C08K 5/3462 (2013.01); C08L 33/02 (2013.01); C08L 33/04 (2013.01); C08L 71/02 (2013.01); C08K 2003/2213 (2013.01); H01L 21/02068 (2013.01);
Abstract
A polishing liquid includes abrasive grains containing at least one selected from the group consisting of cerium oxide and silicon oxide; a nitrogen-containing compound; and water. The nitrogen-containing compound contains nicotinamide. A polishing liquid set includes constituent components of a polishing liquid stored while being divided into a first liquid and a second liquid. A polishing method includes a step of polishing a surface to be polished by using a polishing liquid.