The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2025

Filed:

Aug. 28, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company Limited, Hsinchu, TW;

Inventors:

Yeh-Hsun Fang, Taipei, TW;

Zhi-Wei Zhuang, Hsinchu, TW;

Li-Hsin Chu, New Taipei, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10F 30/22 (2025.01); G01S 7/481 (2006.01); G01S 17/894 (2020.01); H10F 39/00 (2025.01); H10F 39/18 (2025.01); H10F 71/00 (2025.01); H10F 77/122 (2025.01); H10F 77/14 (2025.01);
U.S. Cl.
CPC ...
H10F 39/8033 (2025.01); G01S 7/4816 (2013.01); G01S 17/894 (2020.01); H10F 30/22 (2025.01); H10F 39/014 (2025.01); H10F 39/184 (2025.01); H10F 39/8027 (2025.01); H10F 39/805 (2025.01); H10F 39/8063 (2025.01); H10F 71/00 (2025.01); H10F 77/122 (2025.01); H10F 77/14 (2025.01);
Abstract

A photodetector including a substrate having a semiconductor material layer, such as a silicon-containing layer, and a germanium-based well embedded in the semiconductor material layer, where a gap is located between a lateral side surface of the germanium-based well and the surrounding semiconductor material layer. The gap between the lateral side surface of the germanium-based well and the surrounding semiconductor material layer may reduce the surface contact area between the germanium-containing material of the well and the surrounding semiconductor material, which may be a silicon-based material. The formation of the gap located between a lateral side surface of the germanium-based well and the surrounding semiconductor material layer may help minimize the formation of crystal defects, such as slips, in the germanium-based well, and thereby reduce the dark current and improve photodetector performance.


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