The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2025

Filed:

Feb. 22, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Chi-Chun Peng, Hsinchu, TW;

Chih-Yuan Chiu, Zhudong Township, TW;

Min-Yu Wu, Hsinchu, TW;

Yi-Kai Tu, Hsinchu, TW;

Cheng-Lung Wu, Zhunan Township, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); B23K 1/20 (2006.01); B23K 3/08 (2006.01); H01L 23/32 (2006.01);
U.S. Cl.
CPC ...
H01L 24/97 (2013.01); B23K 1/203 (2013.01); B23K 3/082 (2013.01); H01L 23/32 (2013.01); H01L 24/75 (2013.01); H01L 24/81 (2013.01); H01L 2224/16227 (2013.01); H01L 2224/75183 (2013.01); H01L 2224/81024 (2013.01); H01L 2224/81801 (2013.01); H01L 2924/15311 (2013.01);
Abstract

A die dipping structure includes a plate including a first recessed portion having a first depth and filled with a first flux material. The plate further includes a second recessed portion, isolated from the first recessed portion, with a second depth and filled with a second flux material. The second depth is different from the first depth. The die dipping structure further includes a motor configured to move the plate so as to simultaneously dip a first die and a second die into the flux of the first recessed portion and the flux of the second recessed portion, respectively.


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