The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2025

Filed:

Dec. 16, 2021
Applicants:

Stephen T. Schaefer, Tempe, AZ (US);

Marko S. Milosavljevic, Phoenix, AZ (US);

Rajeev Reddy Kosireddy, Tempe, AZ (US);

Shane R. Johnson, Chandler, AZ (US);

Inventors:

Stephen T. Schaefer, Tempe, AZ (US);

Marko S. Milosavljevic, Phoenix, AZ (US);

Rajeev Reddy Kosireddy, Tempe, AZ (US);

Shane R. Johnson, Chandler, AZ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 23/02 (2006.01); C22C 28/00 (2006.01); C23C 14/14 (2006.01); C23C 14/22 (2006.01); C23C 14/54 (2006.01); C30B 29/52 (2006.01);
U.S. Cl.
CPC ...
C30B 23/02 (2013.01); C22C 28/00 (2013.01); C23C 14/14 (2013.01); C23C 14/221 (2013.01); C23C 14/548 (2013.01); C30B 29/52 (2013.01);
Abstract

The invention relates in part to a growth model for the growth of Group III-Group V (III-V) alloys by molecular beam epitaxy (MBE) based on the kinetics of adsorption, desorption, incorporation, anion exchange, anion-assisted removal, and surface droplet accumulation of the Group V elements. The invention also relates to methods to optimize MBE growth conditions used to produce a target III-V alloy composition. The invention is further related to methods of predicting III-V alloy compositions resulting from a set of MBE growth conditions.


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