The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2025
Filed:
Jun. 02, 2022
Ap Infosense Limited, Hong Kong, HK;
Kam Chiu Lau, Rockville, MD (US);
Yongwoo Park, Rockville, MD (US);
Po Shan Chan, Hong Kong, HK;
Man Wai Cheng, Hong Kong, HK;
Fei Yeung, Hong Kong, HK;
Qi Lang, Hong Kong, HK;
AP Infosense Limited, Hong Kong, HK;
Abstract
A three-dimensional profiler includes a broadband radiation source. An interferometric system receives the radiation and includes first and second beam splitters, a moving time delay-inducing reflector, and a stationary reflector. The interferometric system creates a time-delayed optical sample radiation source and an optical reference incident radiation source with the first beam splitter. A stationary sample holder receives the optical sample incident radiation. A reference plane receives the optical reference incident radiation. A detector receives an interference signal from reflected or scattered optical sample radiation and reflected or scattered optical reference radiation. A processor extracts an optical path difference between the reference plane and the sample and reconstructs a three-dimensional morphology of the sample.