The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2025

Filed:

Jan. 17, 2022
Applicant:

Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai, CN;

Inventors:

Xuejian Liu, Shanghai, CN;

Hui Zhang, Shanghai, CN;

Xiumin Yao, Shanghai, CN;

Yan Liu, Shanghai, CN;

Jindi Jiang, Shanghai, CN;

Zhengren Huang, Shanghai, CN;

Zhongming Chen, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 37/00 (2025.01); C04B 35/584 (2006.01); C04B 37/00 (2006.01);
U.S. Cl.
CPC ...
C04B 37/006 (2013.01); C04B 35/584 (2013.01); C04B 2237/125 (2013.01);
Abstract

A preparation method for a copper plate-covered silicon nitride ceramic substrate is provided. The structure of the copper plate-covered silicon nitride ceramic substrate includes a silicon nitride ceramic substrate, copper sheets disposed on the upper and lower sides of the silicon nitride ceramic substrate and soldering layers disposed between the copper sheets and the silicon nitride ceramic substrate; the composition of the silicon nitride ceramic substrate comprises a silicon nitride phase (more than or equal to 95 wt %); and a grain boundary phase (containing at least three elements (Y, Mg and O) and less than or equal to 5 wt %, and the content of a crystalline phase in the grain boundary phase is more than or equal to 40 vol %); and the sintering aids are YOand MgO. The two-step sintering process comprises: in a nitrogen atmosphere, performing low-temperature heat treatment and high-temperature heat treatment in sequence.


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