The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 01, 2025

Filed:

May. 26, 2022
Applicant:

Nxp Usa, Inc., Austin, TX (US);

Inventors:

Tanuj Saxena, Chandler, AZ (US);

Christian Torrent, Montauban, FR;

Vishnu Khemka, Chandler, AZ (US);

Ganming Qin, Chandler, AZ (US);

Moaniss Zitouni, Gilbert, AZ (US);

Assignee:

NXP USA, Inc., Austin, TX (US);

Primary Examiner:
Int. Cl.
CPC ...
H01L 29/40 (2006.01); H10D 30/01 (2025.01); H10D 30/66 (2025.01); H10D 64/00 (2025.01); H10D 64/01 (2025.01); H10D 64/23 (2025.01); H10D 84/00 (2025.01);
U.S. Cl.
CPC ...
H10D 64/117 (2025.01); H10D 30/0297 (2025.01); H10D 30/665 (2025.01); H10D 30/668 (2025.01); H10D 64/01 (2025.01); H10D 64/258 (2025.01); H10D 84/141 (2025.01);
Abstract

A high voltage trench field plate power MOSFET device is fabricated in a substrate having first and second trenches separated from one another by a narrow epitaxial semiconductor drift pillar structure, where insulated gate electrode layers and insulated field plate layers are formed in the first and second trenches, and where a body well region is formed in an upper portion of the narrow epitaxial semiconductor drift pillar structure to include source contact regions in an active area, and to include an integrated ballast resistor section which connects one or more of the source contact regions to the termination area and which has no source contact regions.


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