The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2025
Filed:
Aug. 08, 2022
Gudeng Precision Industrial Co., Ltd., New Taipei, TW;
Ming-Chien Chiu, New Taipei, TW;
Chia-Ho Chuang, New Taipei, TW;
Kuo-Hua Lee, New Taipei, TW;
Shu-Hung Lin, New Taipei, TW;
Hao-Kang Hsia, New Taipei, TW;
GUDENG PRECISION INDUSTRIAL CO., LTD., New Taipei, TW;
Abstract
The present invention provides a wafer container and a gas diffusion device applied in the wafer container. The wafer container includes a shell, and all components included and applied on the shell are made of thermal resistance materials. The gas diffusion device and the wafer container, when assembled together, utilize a coupling structure and a collar as a protection mechanism for the gas diffusion device. The gas diffusion device has a buffering chamber that provides a buffering tolerance and a communicating space for the gas before the gas enters an interior space of the wafer container.