The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2025
Filed:
Dec. 26, 2020
Intel Corporation, Santa Clara, CA (US);
David Gonzalez Aguirre, Portland, OR (US);
Julio Zamora Esquivel, Zapopan, MX;
Javier Felip Leon, Hillsboro, OR (US);
Ignacio J. Alvarez, Portland, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Disclosed herein are systems and methods for privacy-preserving facemask-compliance-level measurement. In an embodiment, a mask-compliance measurement system includes a processor that is configured to generate, from an image of a person, a facial depth image of a region of a face of the person, and to generate facial wavelet descriptors from the facial depth image. The processor is also configured to determine spectral-density values of the wavelet descriptors, and to analyze the spectral-density values to generate a mask-wearing-compliance result for the person. In an embodiment, the analyzing includes using a classification model that is trained to classify sets of spectral-density values with respect to facemask wearing in images from which the spectral-density values were derived.