The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2025
Filed:
Jun. 10, 2022
Changxin Memory Technologies, Inc., Hefei, CN;
Yanhong Zhang, Hefei, CN;
Peng Yang, Hefei, CN;
CHANGXIN MEMORY TECHNOLOGIES, INC., Hefei, CN;
Abstract
The present disclosure provides a semiconductor structure and a manufacturing method thereof. The manufacturing method of a semiconductor structure includes providing a substrate having trenches, regions other than the trenches in the substrate form a plurality of active regions at intervals; forming a first isolation layer and a second isolation layer, a top surface of the first isolation layer is lower than a top surface of the second isolation layer, a groove is formed between the second isolation layer and the active region; forming a barrier layer in the groove, an etching rate of the barrier layer is lower than an etching rate of the first isolation layer; and forming a third isolation layer in an intermediate trench, the intermediate trench is filled with the third isolation layer, and the first isolation layer, the second isolation layer, the third isolation layer, and the barrier layer form an isolation structure.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile