The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2025
Filed:
Jun. 24, 2022
Semiconductor Manufacturing International (Shanghai) Corporation, Shanghai, CN;
Semiconductor Manufacturing International (Beijing) Corporation, Beijing, CN;
Jisong Jin, Shanghai, CN;
Abstract
Semiconductor device is provided. The semiconductor device includes a to-be-etched layer having a plurality of first regions and a plurality of second regions that are alternately arranged along a first direction, where the second region includes a second trench region; a first mask layer on the plurality of first regions and the plurality of second regions of the to-be-etched layer; a second mask layer on the first mask layer; a first trench penetrating the first mask layer and the second mask layer over a first region of the plurality of first regions; a mask sidewall spacer on sidewall surfaces of the first trench; and second trenches over the plurality of second trench regions of the plurality of second regions, where a sidewall surface of the second trench exposes a corresponding mask sidewall spacer of an adjacent first trench.