The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2025
Filed:
Apr. 04, 2024
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventor:
Yohei Sano, Kumamoto, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); G03F 7/09 (2006.01); G03F 7/20 (2006.01); H01L 21/02 (2006.01); H01L 21/324 (2006.01); H05B 3/26 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0274 (2013.01); G03F 7/09 (2013.01); G03F 7/20 (2013.01); H01L 21/02104 (2013.01); H01L 21/324 (2013.01); H05B 3/262 (2013.01); H05B 2203/022 (2013.01);
Abstract
A heat treatment device includes: a heating plate configured to support and heat a substrate on which a metal containing resist film is formed; a chamber configured to cover a processing space above the heating plate; a gas supply configured to supply a gas into the chamber along a gas flow path connected to an inside of the chamber, the gas flow path being directed toward the substrate; and an exhaust port configured to evacuate inside of the chamber.