The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2025

Filed:

Mar. 16, 2023
Applicants:

Kla Corporation, Milpitas, CA (US);

National Institute of Advanced Industrial Science and Technology, Tokyo, JP;

Inventors:

Yung-Ho Alex Chuang, Cupertino, CA (US);

Yinying Xiao-Li, San Jose, CA (US);

Edgardo García Berríos, San Jose, CA (US);

John Fielden, Los Altos, CA (US);

Lavinia Ghirardini, San Jose, CA (US);

Masayoshi Nagao, Ibaraki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01); H01J 37/073 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/073 (2013.01); H01J 37/28 (2013.01); H01J 2237/2812 (2013.01);
Abstract

An electron gun for an electron microscope or similar device includes a field emitter cathode having a field emitter protrusion extending from the output surface of a monocrystalline silicon substrate, and electrodes configured to enhance the emission of electrons from a tip portion of the field emitter protrusion to generate a primary electron beam. A contiguous TiN layer is disposed directly on at least the tip portion of the field emitter protrusion using a process that minimizes oxidation and defects in the TiN layer.


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