The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2025
Filed:
Apr. 25, 2023
Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;
Chin-Min Huang, Taichung, TW;
Ching-Hung Lai, Taipei, TW;
Jia-Guei Jou, New Taipei, TW;
Yin-Chuan Chen, Taichung, TW;
Chi-Ming Tsai, Taipei, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD., Hsinchu, TW;
Abstract
A method for forming a photomask includes following operations. A first photomask is received. The first photomask includes a first pattern and a first scattering bar. The first photomask is used to remove a first portion of a target layer to form a first opening and a second opening. The first opening corresponds to the first pattern, and the second opening corresponds to the first scattering bar. A second photomask is received. The second photomask includes a second pattern. The second photomask is used to remove a second portion of the target layer to form a third opening. The third opening corresponds to the second pattern. The second opening is widened to form the third opening using the second photomask.