The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2025
Filed:
Dec. 07, 2021
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventor:
Yuya Kamei, Koshi, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/32 (2006.01); G03F 7/00 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70925 (2013.01); G03F 7/325 (2013.01); G03F 7/40 (2013.01);
Abstract
A developing method of performing a developing treatment on a substrate includes supplying a developing solution containing an organic solvent to the substrate having a metal-containing coating film exposed into a predetermined pattern; and supplying a cleaning solution containing an organic solvent to the substrate supplied with the developing solution. The cleaning solution is lower in solubility of the metal-containing coating film than the developing solution.
Quick Actions:
Kamei, Yuya. (2025). Developing method and substrate treatment system (U.S. Patent No. 12339593). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12339593
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile