The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2025

Filed:

Dec. 16, 2019
Applicant:

Nuflare Technology, Inc., Kanagawa, JP;

Inventors:

Yoshitaka Ishikawa, Yokohama, JP;

Takehiko Kobayashi, Shizuoka, JP;

Hideshi Takahashi, Yokohama, JP;

Yasushi Iyechika, Chiba, JP;

Takashi Haraguchi, Fujisawa, JP;

Kiyotaka Miyano, Tokyo, JP;

Assignee:

NuFlare Technology, Inc., Kanagawa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C30B 25/04 (2006.01); C23C 16/06 (2006.01); C23C 16/18 (2006.01); C23C 16/34 (2006.01); C23C 16/458 (2006.01); C23C 16/46 (2006.01); C23C 16/48 (2006.01); C30B 25/10 (2006.01); H10H 20/01 (2025.01); H10H 20/812 (2025.01);
U.S. Cl.
CPC ...
C30B 25/04 (2013.01); C23C 16/06 (2013.01); C23C 16/18 (2013.01); C23C 16/34 (2013.01); C23C 16/4584 (2013.01); C23C 16/4586 (2013.01); C23C 16/46 (2013.01); C23C 16/481 (2013.01); C23C 16/482 (2013.01); C30B 25/10 (2013.01); H10H 20/01335 (2025.01); H10H 20/812 (2025.01);
Abstract

A vapor phase growth apparatus according to an embodiment includes a reaction chamber, a holder provided in the reaction chamber, the holder holding a substrate, a heater heating the substrate, a first reflector facing the holder, the heater being interposed between the first reflector and the holder, a second reflector provided between the first reflector and the heater, the second reflector having a compressive strength or a bending strength equal to or less than 1000 MPa or a Vickers hardness equal to or less than 8 GPa, the second reflector having a pattern, and a rotating shaft fixed to the holder, the rotating shaft rotating the holder.


Find Patent Forward Citations

Loading…