The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 17, 2025

Filed:

May. 15, 2020
Applicant:

Institute of Microelectronics, Chinese Academy of Sciences, Beijing, CN;

Inventors:

Huai Lin, Beijing, CN;

Guozhong Xing, Beijing, CN;

Ming Liu, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 11/16 (2006.01); H10B 61/00 (2023.01);
U.S. Cl.
CPC ...
H10B 61/10 (2023.02); G11C 11/161 (2013.01); G11C 11/1659 (2013.01); G11C 11/1673 (2013.01); G11C 11/1675 (2013.01); H10B 61/20 (2023.02);
Abstract

A two-dimensional material-based selector includes: a stack unit, wherein the stack unit has a metal-two-dimensional semiconductor-metal structure comprising a two-dimensional semiconductor layer, and metal layers arranged on an upper surface and a lower surface of the two-dimensional semiconductor layer, respectively. The number of the stack units is N, where N≥1. In each stack unit, a Schottky contact is formed on two metal-two-dimensional conductor interfaces, and the stack unit includes two Schottky diode structures connected in reverse series in response to the two-dimensional material-based selector being turned on. Alternatively, the number of the stack units is M, where M≥2. In each stack unit, a Schottky contact and an Ohmic contact are formed the two metal-two-dimensional conductor interfaces, respectively. The M stack units include M Schottky diode structures connected in reverse series in response to the two-dimensional material-based selector being turned on.


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