The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2025
Filed:
Aug. 10, 2023
Applicant:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Inventors:
Assignee:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/56 (2006.01); B08B 5/02 (2006.01); B08B 7/02 (2006.01); B08B 7/04 (2006.01); B08B 9/00 (2006.01); B08B 13/00 (2006.01); C23C 14/34 (2006.01); C23C 14/50 (2006.01);
U.S. Cl.
CPC ...
C23C 14/564 (2013.01); B08B 5/02 (2013.01); B08B 7/028 (2013.01); B08B 7/04 (2013.01); B08B 9/00 (2013.01); B08B 13/00 (2013.01); C23C 14/34 (2013.01); C23C 14/50 (2013.01); B08B 2209/005 (2013.01);
Abstract
A deposition system is provided capable of cleaning itself by removing a target material deposited on a surface of a collimator. The deposition system in accordance with the present disclosure includes a substrate process chamber. The deposition includes a substrate pedestal in the substrate process chamber, the substrate pedestal configured to support a substrate, a target enclosing the substrate process chamber, and a collimator having a plurality of hollow structures disposed between the target and the substrate, a vibration generating unit, and cleaning gas outlet.