The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2025
Filed:
May. 13, 2020
Applicant:
Showa Denko K.k., Tokyo, JP;
Inventors:
Yuki Miura, Yokohama, JP;
Keiichi Nakamura, Kawasaki, JP;
Assignee:
Resonac Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08C 1/04 (2006.01); C08C 1/075 (2006.01); C08C 1/12 (2006.01); C08L 11/02 (2006.01);
U.S. Cl.
CPC ...
C08C 1/04 (2013.01); C08L 11/02 (2013.01);
Abstract
Provided is a method for producing purified chloroprene-based-polymer latex which enables efficiently removing a residual volatile organic substance from chloroprene-based-polymer latex while suppressing foaming and the deposition of aggregates. The method for producing purified chloroprene-based-polymer latex of the present invention has at least the following steps (I) to (III):