The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2025
Filed:
Jun. 24, 2022
Shanghai Huali Integrated Circuit Corporation, Shanghai, CN;
Shuo Liu, Shanghai, CN;
Shanghai Huali Integrated Circuit Corporation, Shanghai, CN;
Abstract
The present application discloses a dose mapper method, which includes: step 1: collecting critical dimension fingerprint of each tool and each mask and storing the critical dimension fingerprint in a database; step 2: before exposing a wafer, pre-selecting the tool and the mask to be used, selecting the corresponding critical dimension fingerprint from the database and combining the corresponding critical dimension fingerprint to form total critical dimension fingerprint; step 3: obtaining dose mapper data for exposure of the wafer according to the total critical dimension fingerprint; step 4: exposing the wafer, and correcting the exposure of the wafer according to the dose mapper data in an exposure process. The present application can quickly and easily generate a dose mapper data file, especially when there is a new tool or mask to be expanded, thus improving the efficiency of generating the dose mapper data file and improving the production capacity.