The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 03, 2025

Filed:

Dec. 13, 2023
Applicant:

Northwestern University, Evanston, IL (US);

Inventors:

Vinod K. Sangwan, Evanston, IL (US);

Hong-Sub Lee, Evanston, IL (US);

Mark C. Hersam, Wilmette, IL (US);

Assignee:

NORTHWESTERN UNIVERSITY, Evanston, IL (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10N 70/20 (2023.01); G11C 13/00 (2006.01); H10B 63/00 (2023.01); H10N 70/00 (2023.01); G06N 3/049 (2023.01); G06N 3/065 (2023.01); G06N 3/088 (2023.01);
U.S. Cl.
CPC ...
H10N 70/253 (2023.02); G11C 13/0002 (2013.01); H10B 63/30 (2023.02); H10N 70/023 (2023.02); H10N 70/24 (2023.02); H10N 70/823 (2023.02); H10N 70/841 (2023.02); H10N 70/8822 (2023.02); H10N 70/8825 (2023.02); G06N 3/049 (2013.01); G06N 3/065 (2023.01); G06N 3/088 (2013.01);
Abstract

One aspect of the invention relates to a method for fabricating a memtransistor comprising growing a polycrystalline monolayer film on a substrate, wherein the polycrystalline monolayer film contains grains defining a plurality of grain boundaries thereof; and forming an electrode array on the grown polycrystalline monolayer film, wherein the electrode array has a plurality of electrodes electrically coupled with the polycrystalline monolayer film such that each pair of electrodes defines a channel in the polycrystalline monolayer film therebetween.


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