The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 03, 2025

Filed:

Jan. 25, 2022
Applicant:

National Institute of Advanced Industrial Science and Technology, Tokyo, JP;

Inventors:

Hideaki Yamada, Ikeda, JP;

Akiyoshi Chayahara, Ikeda, JP;

Yoshiaki Mokuno, Ikeda, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/00 (2006.01); C23C 16/511 (2006.01); H05H 1/46 (2006.01);
U.S. Cl.
CPC ...
H05H 1/01 (2021.05); C23C 16/511 (2013.01); H05H 1/4622 (2021.05);
Abstract

A microwave plasma treatment device includes a resonator including a container; a single microwave oscillation source that outputs a reference microwave; a waveguide that connects the microwave oscillation source and the resonator to each other; and a phase control mechanism that generates a modified microwave having a phase different from a phase of the reference microwave by controlling the phase of the reference microwave. The resonator includes one or more first-type introducing portions for introducing the reference microwave into the resonator and one or more second-type introducing portions for introducing the modified microwave into the resonator, and the microwave plasma treatment device is configured such that at least one of a position, a size, and a shape of a plasma ball generated in the container is changed by superimposing the modified microwave on the reference microwave in the resonator.


Find Patent Forward Citations

Loading…