The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 03, 2025

Filed:

Feb. 28, 2023
Applicant:

Picarro, Inc., Santa Clara, CA (US);

Inventors:

Jeffrey Michael Headrick, Alamo, CA (US);

Wei Jian Chin, Sunnyvale, CA (US);

Chris W. Rella, Sunnyvale, CA (US);

Assignee:

Picarro, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 33/00 (2006.01); G01F 5/00 (2006.01); G01F 15/00 (2006.01);
U.S. Cl.
CPC ...
G01N 33/0016 (2013.01); G01F 5/005 (2013.01); G01F 15/005 (2013.01);
Abstract

An equal mixture of gas flows from multiple inputs is provided to gas analysis instrumentation, despite the unequal gas flow properties of the inputs often seen in practice. E.g., due to unequal input sample line lengths. We provide gas flow symmetry into a gas manifold that provides the output(s) to the gas analysis instrument(s). Such symmetry has two parts—equal gas flow properties from a set of reference points (one reference point for each input) to the manifold, and equal pressures at the reference points. Such equal pressures can be provided for unequal input gas flow properties by having a bypass valve for each input controlled so as to equalize the pressures.


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