The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2025
Filed:
Apr. 01, 2022
Kyocera International Inc., San Diego, CA (US);
James June-Ming Wang, San Diego, CA (US);
Yuh-Min Lin, San Diego, CA (US);
Powei Chen, San Diego, CA (US);
Kyocera International Inc, San diego, CA (US);
Abstract
Radio Frequency (RF) circuit (amplifiers, mixer, etc.) design with RFIC, e.g., implemented in CMOS, CaAs, SiGe, or other silicon processes, suffers performance variations (gain phase, frequency, bandwidth, nonlinearity) due to wafer process variations, temperature changes, and supply voltage changes, and random variations. In this invention, methods are proposed to precisely calibrate the bias current of all active devices in the system, and to precisely calibrate the gain of individual path leading to each amplifiers such that the same Pout is achieved for all antenna elements in the system.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile