The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2025

Filed:

May. 21, 2020
Applicant:

Cymer, Llc, San Diego, CA (US);

Inventors:

Yuda Wang, San Diego, CA (US);

Rostislav Rokitski, San Diego, CA (US);

Assignee:

Cymer, LLC, San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/22 (2006.01); H01S 3/00 (2006.01); H01S 3/10 (2006.01); H01S 3/101 (2006.01); H01S 3/225 (2006.01); H01S 3/23 (2006.01);
U.S. Cl.
CPC ...
H01S 3/005 (2013.01); H01S 3/1003 (2013.01); H01S 3/101 (2013.01); H01S 3/225 (2013.01); H01S 3/2207 (2013.01); H01S 3/2333 (2013.01);
Abstract

An apparatus includes: abeam splitter on abeam path, the beam splitter configured to receive light from a deep ultraviolet (DUV) light source; and a first plurality of reflective optical elements on the beam path. The beam splitter is configured to direct a portion of the light received from the DUV light source toward the first plurality of reflective optical elements; the first plurality of reflective optical elements is configured to rotate a divergence of the portion of the light to produce rotated light; and the beam splitter is configured to direct the rotated light and a portion of the light received from the DUV light source onto an output beam path.


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