The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2025

Filed:

Aug. 30, 2021
Applicant:

Mitutoyo Corporation, Kanagawa-ken, JP;

Inventor:

Nick Hartmann, Newcastle, WA (US);

Assignee:

Mitutoyo Corporation, Kanagawa-ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01S 7/48 (2006.01); G01S 7/4865 (2020.01); G02B 27/10 (2006.01); G03H 1/06 (2006.01);
U.S. Cl.
CPC ...
G01S 7/4865 (2013.01); G02B 27/1006 (2013.01); G03H 1/06 (2013.01);
Abstract

A digital holography metrology system is provided including a heterodyne light source, an interferometric optical arrangement and a sensor arrangement. The heterodyne light source provides combined laser beams of different corresponding frequencies and wavelengths (e.g., for which each combined beam may include a corresponding wavelength laser beam and a corresponding frequency shifted laser beam, which may be orthogonally polarized). The interferometric optical arrangement utilizes the combined beams for providing an output for imaging a workpiece, for which the output includes interference beams. The sensor arrangement includes dichroic components which separate the interference beams to be directed to respective time of flight sensors. The outputs from the time of flight sensors are utilized to determine measurements (e.g., the outputs of the time of flight sensors may be utilized to determine a measurement distance to a surface point on a workpiece, etc.).


Find Patent Forward Citations

Loading…