The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2025

Filed:

May. 03, 2024
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventor:

Nazila Dadvand, Richardson, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C25D 3/38 (2006.01); C22C 9/04 (2006.01); C25D 5/02 (2006.01); C25D 5/10 (2006.01); C25D 5/50 (2006.01); C25D 7/12 (2006.01); H01L 23/00 (2006.01);
U.S. Cl.
CPC ...
C25D 3/38 (2013.01); C25D 5/022 (2013.01); C25D 5/10 (2013.01); C25D 5/50 (2013.01); C25D 7/123 (2013.01); H01L 24/03 (2013.01); H01L 24/05 (2013.01); H01L 24/13 (2013.01); C22C 9/04 (2013.01); H01L 2224/03462 (2013.01); H01L 2224/0401 (2013.01); H01L 2224/05008 (2013.01); H01L 2224/05083 (2013.01); H01L 2224/05118 (2013.01); H01L 2224/05147 (2013.01); H01L 2224/05166 (2013.01); H01L 2224/05184 (2013.01); H01L 2224/13026 (2013.01); H01L 2224/13082 (2013.01);
Abstract

A microelectronic device is formed by forming a seed layer that contains primarily zinc. A plating mask is formed over the seed layer, and a copper strike layer is formed on the seed layer using a neutral pH copper plating bath. A main copper layer is formed on the copper strike layer by plating copper on the copper strike layer. The plating mask is subsequently removed. The main copper layer, the copper strike layer, and the seed layer are heated to diffuse copper and zinc, and form a brass layer under the main copper layer, consuming the seed layer between the main copper layer and the substrate. Remaining portions of the seed layer are removed by a wet etch process. The main copper layer and the underlying brass layer provide a conductor structure.


Find Patent Forward Citations

Loading…