The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2025
Filed:
Jun. 11, 2020
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Abstract
There is provided a method of manufacturing a polycrystalline silicon rod suitable as a raw material for manufacturing monocrystalline silicon by a FZ process. The method of manufacturing a polycrystalline silicon rod according to the present invention is a method of manufacturing a polycrystalline silicon rod by Siemens process, and includes a post-deposition energization step of, after an end of a deposition step of polycrystalline silicon, performing energization under a condition that provides a skin depth D shallower than a skin depth Dprovided at a time when the deposition step ends. For example, the post-deposition energization step is performed by passage of current at a frequency f higher than a frequency fof current that is passed at a time when the deposition step ends.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile