The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2025

Filed:

Nov. 28, 2019
Applicant:

Mitsubishi Electric Corporation, Tokyo, JP;

Inventors:

Rina Tanaka, Tokyo, JP;

Yutaka Fukui, Tokyo, JP;

Hideyuki Hatta, Tokyo, JP;

Kohei Adachi, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/04 (2006.01); H01L 29/16 (2006.01); H02M 7/5387 (2007.01); H10D 30/66 (2025.01); H10D 62/17 (2025.01); H10D 62/832 (2025.01);
U.S. Cl.
CPC ...
H10D 62/8325 (2025.01); H01L 21/0465 (2013.01); H02M 7/53871 (2013.01); H10D 30/668 (2025.01); H10D 62/393 (2025.01);
Abstract

A silicon carbide semiconductor device includes: a body region of a second conductivity type provided on a drift layer of a first conductivity type; a source region of a first conductivity type provided on the body region; a source electrode connected to the source region; a gate insulating film provided on an inner surface of a trench; a gate electrode provided inside the trench with interposition of the gate insulating film; a protective layer of a second conductivity type provided below the gate insulating film; a connection layer of a second conductivity type being in contact with the protective layer and the body region; and an electric field relaxation layer of a second conductivity type being in contact with a bottom surface of the connection layer, provided below the connection layer, and having a lower impurity concentration of a second conductivity type than the connection layer.


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