The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2025

Filed:

Aug. 11, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Chang Seok Kang, Santa Clara, CA (US);

Tomohiko Kitajima, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/11524 (2017.01); G11C 8/14 (2006.01); G11C 16/04 (2006.01); H10B 41/27 (2023.01); H10B 41/35 (2023.01);
U.S. Cl.
CPC ...
H10B 41/35 (2023.02); G11C 8/14 (2013.01); G11C 16/0483 (2013.01); H10B 41/27 (2023.02);
Abstract

Described is a memory string including at least one select gate for drain (SGD) transistor and at least one memory transistor in a vertical hole extending through a memory stack on a substrate. The memory stack comprises alternating non-replacement word lines and replacement insulators. A filled slit extends through the memory stack, and there are at least two select gate for drain (SGD) isolation regions in the memory stack adjacent the filled slit. A select-gate-for-drain (SGD) cut is patterned into the top few pairs of alternating layers in the memory stacks. Through the cut opening, the sacrificial layer of the memory stacks is removed, and an insulator layer is used to fill the opening.


Find Patent Forward Citations

Loading…