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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12309993 B1

PDFFull Text
Date of Patent:
May. 20, 2025

Filed:

Oct. 13, 2023

Pattern layout and the forming method thereof

Applicant:

Fujian Jinhua Integrated Circuit Co., Ltd., Quanzhou, CN;

Inventor:

Yifei Yan, Quanzhou, CN;

Assignee:

Fujian Jinhua Integrated Circuit Co., Ltd., Quanzhou, CN;

Attorney:

Winston Hsu

Primary Examiner:

Nicholas J Tobergte

Assistant Examiner:

William Henry Anderson

Int. Cl.
CPC ...
G03F 1/36 (2012.01); G03F 7/00 (2006.01); G06F 30/392 (2020.01); H01L 23/528 (2006.01); H10B 12/00 (2023.01); H10D 89/10 (2025.01);
U.S. Cl.
CPC ...
H10B 12/00 (2023.02); G03F 1/36 (2013.01); G03F 7/70441 (2013.01); G06F 30/392 (2020.01); H01L 23/528 (2013.01); H10B 12/02 (2023.02); H10B 12/30 (2023.02); H10B 12/482 (2023.02); H10B 12/488 (2023.02); H10D 89/10 (2025.01);
Abstract

The invention discloses a pattern layout of an active region and a forming method thereof. The feature of the present invention is that in the sub-pattern unit, an appropriate active area pattern is designed according to the bit line pitch (BLP) and the word line pitch (WLP), the active area pattern is a stepped pattern formed by connecting a plurality of rectangular patterns in series, and the active area pattern is arranged along a first direction, the angle between the first direction and the horizontal direction is A. In addition, according to the angle A, the shortest distance (P) between adjacent stepped patterns, the length and width of sub-pattern units, etc., The positions of some stepped active area patterns are adjusted, so that the distance between multiple active area patterns can be consistent when being repeatedly arranged, thereby improving the uniformity of overall pattern distribution.

Find Patent Forward Citations

Yan, Yifei. (2025). Pattern layout and the forming method thereof (U.S. Patent No. 12309993). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12309993

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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