The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2025
Filed:
Apr. 12, 2024
Applicant:
Nanotech Inc., Gyeonggi-do, KR;
Inventor:
Dong Ho Cha, Gyeonggi-do, KR;
Assignee:
NANOTECH INC., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32504 (2013.01); C23C 16/50 (2013.01); H01J 37/32183 (2013.01); H01J 37/32568 (2013.01); H01J 37/32651 (2013.01); H01J 37/32834 (2013.01); H01J 2237/022 (2013.01); H01J 2237/026 (2013.01); H01J 2237/332 (2013.01);
Abstract
The present invention relates to a technology for increasing the reliability of measurement by preventing the contamination of a self-plasma chamber provided in order to monitor a deposition operation performed in a process chamber, and has a shielding means capable of preventing an inflow of negative electrode material, which is generated by a sputtering phenomenon, into a discharge chamber when a positive charge of plasma, which is generated in the self-plasma chamber, collides with a negative electrode.