The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2025
Filed:
Aug. 23, 2022
Applicant:
Applied Materials Israel Ltd., Rehovot, IL;
Inventors:
Sissi Lachmi, Rehovot, IL;
Hagay Famini, Moshav Ptachia, IL;
Assignee:
Applied Materials Israel Ltd., Rehovot, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/21 (2006.01); H01J 37/147 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/21 (2013.01); H01J 37/1478 (2013.01); H01J 37/28 (2013.01); H01J 2237/216 (2013.01);
Abstract
A charged particle evaluation system that may include a column that includes an opening; an illumination unit that is configured to scan an area of a sample with an electron beam that passes through the opening; and an optical auto-focus unit that is configured to (i) illuminate the sample with an optical beam that is proximate to the electron beam, during the scan of the area with the electron beam; (ii) receive a reflected optical beam from the sample, (iii) determine a focus status of the electron beam, and (iv) participate in a compensating of an electron beam misfocus.