The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2025
Filed:
Mar. 23, 2022
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Dirk Ehm, Beckingen, DE;
Moritz Becker, Aalen, DE;
Assignee:
CARL ZEISS SMT GMBH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G01N 33/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7085 (2013.01); G01N 33/005 (2013.01); G03F 7/70308 (2013.01);
Abstract
A projection exposure apparatus () for semiconductor lithography has a device for determining the concentration of atomic hydrogen in a plasma () in the region of an optical element (), wherein the device includes a sensor (), In this case, the device includes a filter element () arranged between the region of the plasma () and the sensor (), wherein the filter element () is configured to predominantly allow the passage of atomic hydrogen from the plasma () to the sensor ().