The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2025
Filed:
Aug. 11, 2020
Asml Netherlands B.v., Veldhoven, NL;
Yingchao Cui, Eindhoven, NL;
Hadi Yagubizade, Eindhoven, NL;
Xiuhong Wei, Eindhoven, NL;
Daan Maurits Slotboom, Wolphaartsdijk, NL;
Jeonghyun Park, Eindhoven, NL;
Sarathi Roy, Eindhoven, NL;
Yichen Zhang, Eindhoven, NL;
Mohammad Reza Kamali, Eindhoven, NL;
Sang Uk Kim, Yong-In, KR;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A method for determining lithographic matching performance includes obtaining first monitoring data from recurrent monitoring for stability control for an available EUV scanner. For a DUV scanner, second monitoring data is similarly obtained from recurrent monitoring for stability control. The EUV first monitoring data are in a first layout. The DUV second monitoring data are in a second layout. A cross-platform overlay matching performance between the first lithographic apparatus and the second lithographic apparatus is determined based on the first monitoring data and the second monitoring data. This is done by reconstructing the first and/or second monitoring data into a common layout to allow comparison of the first and second monitoring data.