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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12300491 B1

PDFFull Text
Date of Patent:
May. 13, 2025

Filed:

Dec. 16, 2022

Deposition of semiconductor integration films

Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Lakmal Charidu Kalutarage, San Jose, CA (US);

Mark Joseph Saly, Milpitas, CA (US);

Bhaskar Jyoti Bhuyan, Milpitas, CA (US);

Thomas Joseph Knisley, Livonia, MI (US);

Kelvin Chan, San Ramon, CA (US);

Regina Germanie Freed, Los Altos, CA (US);

David Michael Thompson, San Jose, CA (US);

Susmit Singha Roy, Sunnyvale, CA (US);

Madhur Sachan, Belmont, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:

Schwabe, Williamson & Wyatt, P.C.

Primary Examiner:

Julia Slutsker

Int. Cl.
CPC ...
H01L 21/033 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0332 (2013.01); H01L 21/02172 (2013.01); H01L 21/02205 (2013.01); H01L 21/02271 (2013.01); H01L 21/02274 (2013.01); H01L 21/0228 (2013.01); H01L 21/0234 (2013.01);
Abstract

Embodiments disclosed herein include methods of depositing a metal oxo photoresist using dry deposition processes. In an embodiment, the method comprises forming a first metal oxo film on the substrate with a first vapor phase process including a first metal precursor vapor and a first oxidant vapor, and forming a second metal oxo film over the first metal oxo film with a second vapor phase process including a second metal precursor vapor and a second oxidant vapor.

Find Patent Forward Citations

Kalutarage, Lakmal. (2025). Deposition of semiconductor integration films (U.S. Patent No. 12300491). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12300491

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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