The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2025
Filed:
May. 20, 2022
Tokyo Electron Limited, Tokyo, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma processing method includes: (a) mounting a substrate including a first mask layer, which is a removal target, formed on a first layer with a metal-containing layer that is included therein to be partially exposed, on a stage disposed inside a processing container of the plasma processing apparatus; (b) supplying a process gas containing one or more of fluorocarbon gas and hydrofluorocarbon gas into the processing container; (c) supplying a first radio-frequency power that forms a plasma from the process gas into the processing container; (d) supplying a second radio-frequency power having a frequency lower than a frequency of the first radio-frequency power to the stage after a predetermined time is elapsed from stop of the first radio-frequency power; and (e) repeating (c) and (d).