The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 2025

Filed:

Jan. 20, 2022
Applicant:

Applied Materials Israel Ltd., Rehovot, IL;

Inventors:

Einat Frishman, Rehovot, IL;

Ilan Ben-Harush, Tel-Aviv, IL;

Rafael Bistritzer, Petach Tikva, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G01B 11/24 (2006.01); G01N 21/95 (2006.01); G06T 7/64 (2017.01);
U.S. Cl.
CPC ...
G06T 7/0006 (2013.01); G01B 11/24 (2013.01); G01N 21/95 (2013.01); G06T 7/64 (2017.01); G06T 2207/30148 (2013.01);
Abstract

There is provided a system and a method comprising obtaining data Dinformative of a contour of an element of a semiconductor specimen acquired by an examination tool, using the data Dto generate a signal informative of a curvature of the contour of the element, determining at least one of data Dinformative of a periodicity of the signal, or data Dinformative of a number of discontinuities in the signal, wherein each discontinuity is informative of a transition between a convex portion of the contour and a concave portion of the contour, and using at least one of the data Dor the data Dto determine data informative of correct manufacturing of the element.


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